Vacuum Process Gas Analysers for CVD / MOCVD / ALCVD

For direct information on gas uptake and for dissolved output rates

Gas reaction kinetics studies and gas composition measurements are of vital importance in the process development and monitoring of chemical vapour deposition processes.

Vacuum Process Gas Analysers for CVD / MOCVD / ALCVD

OVERVIEW

Application areas include growth of hard coatings, solar cells, diamond, DLC, nitrides, III-V’s and II-VI materials.

Hiden gas and plasma analysers include special sampling technology enabling high sensitivity analysis of the critical species in most CVD techniques including hot filament CVD, plasma enhanced CVD, ALCVD and MOCVD.

SIMS is a high sensitivity surface analysis technique applied to CVD grown thin films.

BROCHURES

PRESENTATIONS

POSTERS