Hiden for quadrupole mass spectrometers
 
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Hiden Analytical’s quadrupole mass spectrometer system are available in special configurations to address specific applications within the semiconductor industry including:

Semiconductor Research

  • Plasma characterisation
  • Depth profiling
  • Reaction kinetics studies
  • Plasma source characterisation
Semiconductor Production
  • Semiconductor process vacuum quality control
  • End point detection in ion beam etch
  • Deposition rate control in MBE
  • Exhaust gas abatement/scrubber system monitoring
  • Entrapped gas analysis in semiconductor packages

 

Ion beam etch end point detector

Products

 

HPR-30 RGA for vacuum, process monitoring, & leak detection

HPR-80 quantitative process gas analyser for reactive species

EQP analyser for neutrals, ions, and radicals

ESPion Langmuir probe for plasma characterisation

Hiden IMP EPD Ion beam etch end point detector

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Hiden for quadrupole mass spectrometers

 

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