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Mass spectrometers for vacuum, gas, plasma and surface science

Applications

Plasma Characterisation

Plasma characterisation, plasma ion analysers and langmuir probes

Plasma chamber

EQP

Analysis of positive and negative ions, neutrals, and radicals

PSM

Plasma sampling mass spectrometer

ESPion

For measurement of plasma properties

HPR-60 MBMS

Molecular beam sampling mass spectrometer for ion and radical analysis

   
   
   
   
   

 

SIMS Surface Analysis and SNMS Surface Analysis

For the determination of surface composition, contaminant analysis and depth profiling

Hard Disk

SIMS Workstation

For thin film depth profiling

EQS

For the analysis of secondary +ve and -ve ions from solid samples

MAXIM

A system for static and dynamic SIMS and SNMS applications

IG5C

A 5KeV Caesium ion gun for UHV surface analysis

IG20

A 5KeV Argon or Oxygen ion source for UHV surface analysis

   
   
   
   

 

UHV Surface Science

For direct information on gas uptake and for dissolved output rates

Wafers

EQS

For the analysis of secondary +ve and -ve ions from solid samples

SIMS Workstation

For thin film depth profiling

EPIC

A system for UHV analysis of neutrals, radicals and ions

3F Series 1000/2000 RGA

For high precision scientific and process applications

IDP

A system for analysis of ions, neutrals and radicals in UHV desorption studies

TPD Workstation

For UHV temperature programmed desorption studies

   
   
   

 

Catalysis

For the determination of surface composition, contaminant analysis and for depth profiling

CATLAB

CATLAB-PCS

Automated microreactor/mass spectrometer system

SpaciMS

Spatially resolved capillary inlet mass spectrometer

HPR-20 QIC R&D

Specialist gas analysis system for advanced research

HPR-20 QIC EGA

Gas analysis system for evolved gas analysis in TGA-MS

HPR-20 QIC TMS

Transient mass spectrometer for fast event gas analysis

3F-PIC

Transient mass spectrometer for fast event UHV studies

HPR-60 MBMS

Molecular beam sampling mass spectrometer for ion and radical analysis

   
   

 

Thin Films and Surface Engineering

Plasma characterisation, plasma ion analysers and langmuir probes

Hard Disk

HPR-30

Process and residual gas analysis

EQP

Analysis of positive and negative ions, neutrals, and radicals

PSM

Plasma sampling mass spectrometer

ESPion

For measurement of plasma properties

TPD Workstation

For UHV temperature programmed desorption studies

SIMS Workstation

For thin film depth profiling

IMP-EPD

For ion etch control and optimum process quality

XBS

MBE deposition flux rate monitor

IG5C

A 5KeV Caesium ion gun for UHV surface analysis

IG20

A 5KeV Argon or Oxygen ion source for UHV surface analysis

 

Residual Gas Analysis for Vacuum Processing

For process monitoring and leak detection

Vacuum chamber

HPR-30

Process and residual gas analysis

HMT

A dual mode RGA system for vacuum diagnostics and process monitoring

3F Series 1000/2000 RGA

For high precision scientific and process applications

   
   
   
   
   
   

 

Thermal Analysis Mass Spectrometer Systems

For evolved gas analysis as a function of time and temperature

Thermal Analysis

CATLAB-PCS

Automated microreactor/mass spectrometer system

TPD Workstation

For UHV temperature programmed desorption studies

HPR-20 QIC R&D

Specialist gas analysis system for advanced research

QGA

A compact bench-top system for real time gas and vapour analysis

   
   
   
   
   

 

Nanotechnology

For the determination of surface composition, contaminant analysis and for depth profiling

Surface Science

SIMS Workstation

For thin film depth profiling

XBS

MBE deposition flux rate monitor

TPD Workstation

For UHV temperature programmed desorption studies

HPR-60 MBMS

A system for analysis of neutrals, radicals and ions

   
   
   
   
   

 

Residual Gas Analysis

For routine, fast, wide dynamic range residual gas analysis

RGA series

RGA Series

Systems for the examination of components present in a vessel or evolved from a process

HMT

A dual mode RGA system for vacuum diagnostics and process monitoring

3F Series 1000/2000 RGA

For high precision scientific and process applications

HPR-30

Process and residual gas analysis

   
   
   
   
   
   

 

Dissolved Species Analysis

For analysis of respiratory gases, hydrocarbons and sulphides

Beach

HPR-40 DSA

Membrane inlet mass spectrometer for dissolved species analysis

   
   
   
   
   
   
   
   

 

Molecular Beam Studies

For molecular beam analysis

Laser

3F Series 1000/2000 RGA

For high precision scientific and process applications

EPIC

A system for UHV analysis of neutrals, radicals and ions

HPR-60 MBMS

Molecular beam sampling mass spectrometer for ion and radical analysis