Hiden plasma probes measure some of the key plasma parameters and provide detailed information relating to plasma reaction chemistry.
Plasma diagnostics for applications in etching, deposition, coating and surface modification.
Hiden EQP and PSM mass/energy analysers are offered with a range of standard sampling options to provide for plasma characterisation in a broad range of applications including:
ECR – Electron Cyclotron Resonance plasma is used for chemical vapour deposition, CVD and etching in semiconductor processing. Magnetic shielding of the EQP and PSM mass/energy analyser enables operation in the high magnetic field environment produced by the ECR plasma source.
Magnetron sputtering is for plasma vapour deposition and is available in DC and RF forms producing a range of thin films used in many industries including decorative coatings, hard disk drive platters , optoelectronics and solar cells.
High power impulse magnetron sputtering, HIPIMS. Pulsed plasma provide high density plasma for adhesion enhancing pre-treatment of the substrate prior to coating deposition (substrate etching) and deposition of thin films with high microstructure density. Hiden’s data acquisition system provides for time resolved data acquisition across the plasma pulse providing mass resolved ion energy information for positive and negative ions.
ICP inductively coupled plasma, and RF plasma are used for many applications including reactive ion etching of thin films. Hiden’s advanced Langmuir probe system, ESPion includes RF compensation circuits to enable operation and data collection from within the plasma RF environment.
Dielectric-barrier discharge (DBD) plasma sources are widely used for surface modification at atmospheric plasma. Hiden’s HPR 60 molecular beam sampling system provides for mass and enrgy analysis of plasma ions, neutrals and radicals from DBD and other plasma sources operating at atmospheric pressure.
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Mass and energy analyser for positive and negative ions, neutrals and neutral radicals analysis.
Advanced langmuir probe for plasma diagnostics.
A residual gas analyser for vacuum process analysis.
Molecular beam sampling mass spectrometer for analysis of neutrals, radicals and ions in plasma at atmospheric pressure.
Plasma ion analyser for positive ions, neutrals, and neutral radicals analysis.
EQP Mass and Energy Plasma Analyser (3.3MB)
ESPION Advanced Langmuir Probes for Plasma Diagnostics (310K)
HPR60 Molecular Beam Sampling Mass Spectrometer (669K)
Mass Spectrometers for Thin Films, Plasma and Surface Engineering (1.1MB)
Atmospheric Plasma Analysis by Molecular Beam MS - GEC 2004 (1377K)
Atmospheric Pressure Plasma Analysis by Modulated Molecular Beam MS - ICPIG 2005 (256K)
Ion Energy Distributions for a DC Plasma - GEC 2003 (250K)
Mass Analysis of CF3I Decomposition in a Surface Barrier Discharge - GEC 2011 (2.8MB)
Mass Spectroscopy of Metastable Atomic Species in Gas Analysis and Processing Plasmas at High Spectrometer Source Pressures - AVS 2011 (1.6MB)
Mass Spectroscopy of Metastable Species during Plasma Processing - GEC 2011 (2.1MB)
Time Resolved Ionisation Studies of HIPIMS - PSE 2006 (848KB)
Charged Particle Analysis in Plasma Assisted Processes (598K)
Low Energy Ne Scattering from Metal Surfaces Using MARISS (322K)
Mass Spectrometry of Processing Plasmas Using the EQP System (552K)
Plasma Diagnostics in High Power Impulse Magnetron Sputtering Discharges - TIRI JSFS 2012 Tokyo YAG (3.52MB)
A Novel Method for the Study of Neutral Components of Processing Plasma (85K)
An Improved Method for the Study of the Neutral Components of Processing Plasma (146K)
Characterisation of an ICP Reactor (I) (158K)
Characterisation of an ICP Reactor (2) (285K)
Energetic (Fast) Neutral Species Analysis (97K)
Energies of Ions Sampled Through a DC Biased RF Driven Electrode (185K)
Energy Distributions of Ions and Atoms from a Magnetron Source (173K)
EQP Diagnostic System Overview (178K)
EQP Radicals Sampled from a Plasma (107K)
EQP/EQS Time Resolved Studies in Ion Beam and Plasma Processes (246K)
ESPION Advanced Langmuir Probe (179K)
ESPION Langmuir Probe for Time Resolved Measurements (336K)
Investigation of Plasmas at Atmospheric Pressures (236K)
Ion Energy Distribution in the Afterglow of a Pulsed ICP (324K)
Ion Energy Distributions of Positive Ions in an Argon Discharge (119K)
Mass Spectrometry of Processing Plasmas with the EQP/Mass Energy Analyser (105K)
The Energies of Positive and Negative Ions in an RF Plasma in Nitrous Oxide (147K)
Data Control Inputs and Outputs and Special Applications (17K)
EQP and EQS Technical Information (201K)
EQP 1000 Series Probe Schematic (66K)
EQP 300 500 Series Probe Schematic (69K)
ESPION Advanced Langmuir Probe (347K)
ESPION Probe Schematic (41K)
ESPION Standard 300mm Z-Drive Schematic (81K)
HPR60 Modulated Molecular Beam Mass Spectrometer for Reaction Kinetics (168K)
Introduction to Langmuir Probes (148K)