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Quadrupole Mass Spectrometry for Thin Films and Surface Engineering

Semiconductor fabrication includes a wide range of vacuum, gas and plasma processes that require high performance process development and process monitoring for advancing manufacturing processes and increasing production yields.

 

 

Applications

 

Analysis of gas and vapour species
Ion Milling Probe - SIMS End Point Detection for Ion Beam Etch.
Get detailed information relating to plasma reaction chemistry.
High sensitivity detection for the most demanding XHV/UHV environments.
XBX-flux rate deposition monitor for MBE process control.