|Quadrupole Mass Spectrometers for Thin Films and Surface Engineering|
Thin film processing in research, development and functionalisation of surfaces has a broad application range in microelectronics, nanotechnology, solar, flat panel, mechanics, optics, photonics, textiles, coatings, chemistry, biology, and medicine.
Hiden mass spectrometers are used for process control including SIMS end point detection of ion beam etch of magnetic thin films, III-V layers including gallium arsenide, and superconducting thin films including YBaCuO yttrium barium copper oxide, and for flux monitoring where precise control of film growth in MBE is required.
Residual gas analyzers are used for process monitoring and leak detection, offering a unique window into the vacuum processing environment. Analysis of the partial pressures of vacuum residuals including water vapor, hydrocarbons ,VOC's, and air leaks is routine.
The Hiden SIMS workstation is used for post process analysis of thin films providing depth profiling and fine focus surface imaging of MBE grown thin films, glass coatings, magnetic thin films and metal oxides.
For further information about a specific application of Hiden mass spectrometers and residual gas analyzers for thin film and surface engineering please click on a panel below..............
Analysis of gas and vapour species
Ion Milling Probe - SIMS End Point Detection for Ion Beam Etch.
Get detailed information relating to plasma reaction chemistry.
High sensitivity detection for the most demanding XHV/UHV environments.
XBX-flux rate deposition monitor for MBE process control.