Thin film processing in research, development and functionalisation of surfaces has a broad application range in microelectronics, nanotechnology, solar, flat panel, mechanics, optics, photonics, textiles, coatings, chemistry, biology, and medicine.

Thin film processing utilises a wide range of techniques, including:

Magnetron sputtering
ALD - atomic layer deposition
CVD - chemical vapour deposition
MOCVD - metal organic chemical vapor deposition
PECVD - plasma enhanced chemical vapor deposition
MBE - molecular beam epitaxial growth
RIE - plasma reactive ion etch
IBE/RIBE - ion beam etch and reactive ion beam etch

Each technique is often tailored for a specific application, requiring special process parameters to produce the surface/film properties required. Hiden mass spectrometers provide critical insight into thin film processing and characterisation enabling optimisation of thin film production and surface quality.

Hiden mass spectrometers are used for process control including SIMS end point detection of ion beam etch of magnetic thin films, III-V layers including gallium arsenide, and superconducting thin films including YBaCuO yttrium barium copper oxide, and for flux monitoring where precise control of film growth in MBE is required.

Residual gas analyzers are used for process monitoring and leak detection, offering a unique window into the vacuum processing environment. Analysis of the partial pressures of  vacuum residuals including  water vapor, hydrocarbons ,VOC's, and  air leaks is routine.

The Hiden SIMS workstation is used for post process analysis of thin films providing depth profiling and fine focus surface imaging of MBE grown thin films, glass coatings, magnetic thin films and metal oxides.

Hiden systems are individually configured to ensure optimum analyser response for sensitivity and speed.

For further information about a specific application of Hiden mass spectrometers and residual gas analyzers for thin film and surface engineering please click on a panel below..............

Applications

 

Residual Gas Analysis

Analysis of gas and vapour species

End Point Detection

Ion Milling Probe - SIMS End Point Detection for Ion Beam Etch.

Plasma Characterisation

Get detailed information relating to plasma reaction chemistry.

Surface Science

High sensitivity detection for the most demanding XHV/UHV environments.

MBE Deposition Rate Monitoring and Control

XBX-flux rate deposition monitor for MBE process control.

Brochures 

 Mass Spectrometers for Thin Films, Plasma and Surface Engineering (1.1MB)