Mass spectrometers for vacuum, gas, plasma and surface science


Semiconductor Production and Research

For advanced manufacturing processes

Measures the concentration of gases and vapours in real time




View full description


Mass range

200, 300 or 510 amu


Minimum detectable concentration



Maximum detectable concentration



Sample inlet pressure

100mbar to 2bar abs


Options for sampling at pressures up to 30Bar


Response time to gas concentration change

300 milliseconds


Fast measurement speed

Up to 500 measurements per second


Sample flow required

Options for < 1 atm cc/min to 20 atm cc/min


Corrosive gas sampling options

For advanced manufacturing processes

Hiden Analytical mass spectrometers and Langmuir probes are used in a wide range of applications for research and production in the semiconductor industry. Residual gas analysers, RGA provide for vacuum diagnostics, contamination monitoring , leak detection and process gas analysis. Hiden Analytical manufactures ruggedized SIMS analysers for end point detection used in hard disk drive production. Our SIMS and TPD surface analysis systems are used by the world’s most advanced semiconductor makers for diagnostics and research. Plasma forms the basis of many important semiconductor process steps including deposition and etching. Hiden’s mass/energy analysers and Langmuir probes are used by the world’s most advanced plasma researchers for analysis of the reaction kinetics of existing and new plasma processes.



Residual gas analysis

Plasma characterisation

Surface science

Related Products

RGA Series




TPD Workstation

SIMS Workstation






RGA - Residual Gas Analysis
Hiden RGA SeriesHPR-30 and HMT products provide for vacuum diagnostics, contamination monitoring, leak detection and process gas analysis. Hiden RGA systems are offered for analysis in most semiconductor processes including ALD, MBE, CVD, PECVD, MOCVD, RIE and IBE.

SIMS-end point
Hiden’s IMP-EPD system is used by the world’s largest manufacturers of hard disc drives for precise control of the end point in the ion beam etch step in the production of read/write heads. End point detection on the nano scale is demanded by the latest device technology.

SIMS and TPD surface analysis
Hiden’s SIMS Workstation provides for depth profiling and imaging of the upper most layers of semiconductor devices. Hiden’s UHV TPD Workstation is a  temperature programmed desorption system for the analysis of gas and vapour out gassing and diffusion over the temperature range from ambient to 1000oC.
Plasma Characterisation
Hiden’s EQP mass energy analyser provides for analysis of positive and negative ions, neutrals and neutral radicals. EQP systems are tailored to specific plasma processes  with options for magnetic shielding for magnetically confined plasma and programmable signal gating for time resolved studies in pulsed plasma processes for example. The Hiden PSM mass energy analyser is a simplified version of the EQP offering positive ion analysis and RGA functions for plasma process diagnostics. Hiden’s ESPion Langmuir probes provide for detailed analysis of the electrical characteristics of plasma including the plasma ion and electron densities, plasma potential and electron temperature.