Home Product Catalogue Residual Gas Analysers HPR-80 Quantitative Gas Analyser for Reactive / Corrosive Species
HPR-80 Quantitative Gas Analyser for Reactive / Corrosive Species

Rapid, quantitative analysis of reactive / corrosive mixtures in your chamber / produced in your process

 

  • Plasma / Reactive ion Etch Studies
  • CVD / PVD / MOCVD
  • Semiconductor wafer-fab studies
  • Vacuum / Plasma Processing
  • Quantitative analysis of reactive species
  • HF, HCl, HBr, and CFC processes studies

 

Hiden HPR-80, a specifically designed system for high performance corrosive gas analysis and monitoring for semiconductor and vacuum processes, featuring:

 

  • Heated Electro-polished heated flexible bellows, quick coupling port connector.
  • Purged, inert viscous flow QIC calibration inlet for quantitative analyses.
  • High Sensitivity (to 5 ppb), Mass to 2500 amu.
  • 1 mTorr to Atmosphere sampling pressure operation.
  • Capacitance manometer for species independent pressure monitoring.
  • Stability (less than ±0.5% height variation over 24h).
  • MASsoft control via RS232, RS485 or Ethernet LAN.
  • Matrix Inversion, Normalisation and Single Peak Referencing.

 

 

For more information, contact Hiden using the Online Contact Form. 

 

 

 

 

Application Notes

 

icon Plasma Workstation - ICP Research Plasma Cell with EQP Ion Mass/Energy Analyser (2.26MB)

 

 

Technical Information

 

icon ICP Research Plasma Cell with EQP Ion Mass/Energy Analyser (353K)

 

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