The only dedicated end point determination tool for ion etch control and optimum process quality.

End point Analysis. Target Impurity Determination. Quality Control / SPC. Residual Gas Analysis. Leak Detection

The IMP is a differentially pumped, ruggedized secondary ion mass spectrometer for the analysis of secondary ions and neutrals from the ion mill process, featuring:

• High Sensitivity SIMS / MS with Pulse Ion Counting Detector.
• Triple filter Quadrupole, 300 amu mass range is standard.
• Differentially Pumped Manifold With Mounting Flange to Process Chamber.
• Ion Optics with Energy Analyser and integral ioniser.
• Penning Gauge and interlocks to provide over pressure protection.
• Data System with integration to the process tool.
• Stability (less than ±0.5% height variation over 24 h).
• MASsoft control via RS232, RS485 or Ethernet LAN.
• Programmable DDE, Parallel Digital I / O, RS232 Scripting Communication.

Application Examples

IMP Series End Point Detectors (903K)

 Mass Spectrometers for Thin Films, Plasma and Surface Engineering (1.1MB)

Application Notes

 End Point Detector System for Ion Beam Etch Applications (278K)

 HAL IMP End Point Detector - Materials Guide (74KB)

Technical Information

 Data Control Inputs and Outputs and Special Applications (17K)

Gallery