Home Product Catalogue Process Control Systems XBS MBE Deposition Rate Monitor / Control System
XBS MBE Deposition Rate Monitor / Control System

XBS Triple Filter Quadrupoles for Precision Gas Analysis and Scientific Applications.

 

  • MBE monitoring and control.
  • Molecular Beam Studies.
  • Multiple beam source analysis.
  • High Performance RGA.
  • Desorption / Outgassing studies / Bakeout cycles.
  • Chamber / Process gas Contaminants.

 

Hiden XBS mass spectrometers for high precision scientific, process applications and MBE analysis, featuring:

 

  • High Sensitivity, Enhanced detection from 100% to 5ppb, mass range to 510 amu.
  • Enhanced long-term Stability (less than ±0.5% height variation over 24 h).
  • Crossbeam ion source, beam acceptance through +/- 35° to transverse axis.
  • Ion source control for soft ionisation and appearance potential mass spectrometry.
  • Enhanced sensitivity for high mass transmission, Automatic mass scale alignment.
  • 2mm beam acceptance aperture – configured to specific user application.
  • Enhanced contamination resistance via the RF-only pre-filter stage.
  • Integral UHV compatible water-cooled shroud.
  • Detection limits down to 30 ions / s in molecular beam studies.
  • Monitor growth rates of 1Å / min and lower.
  • Windows™ based MASsoft control via RS232, RS485 or Ethernet LAN.

 

 

Brochures

 

icon XBS Monitor for the Molecular Beam Epitaxy Process (390K)