Home Product Catalogue Surface Science & Materials Analysis IG20 5 KeV Argon or Oxygen ion source for UHV surface analysis applications.
IG20 5 KeV Argon or Oxygen ion source for UHV surface analysis applications.

State of the art ion gun for surface and depth analysis applications.


  • Static and Dynamic SIMS
  • Auger Electron Spectroscopy
  • Ion Beam Sputtering
  • Surface Science Studies
  • Rastering / Depth Profiling


The Hiden IG20 Ion Gun for static and dynamic SIMS, featuring:


  • Intense ion beam with 100 µm spot size and energies from 0.5 – 5 keV.
  • High current density, up to 4.5 mA/cm2.
  • Electron impact ion source with Argon and Oxygen capability.
  • Steering optics for line scattering and beam rastering in depth profiling.
  • 3° offset in the ion gun column for optimum rejection of neutrals.
  • Beam blanking facility for rapid beam switching in rastering applications.
  • Source differential pumping for reduced chamber gas load.
  • Easily replaceable twin filament assembly.
  • Sweep rates down to 64 µs.
  • Integrated operation with SIM and EQS probes for direct raster rate / area control.



For more information, contact Hiden using the Online Contact Form



Brochures


icon IG20 Oxygen/Gas Gun (840K)





Application Notes


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