Home Product Catalogue Surface Science & Materials Analysis IG20 5 KeV Argon or Oxygen ion source for UHV surface analysis applications.
IG20 5 KeV Argon or Oxygen ion source for UHV surface analysis applications.

State of the art ion gun for surface and depth analysis applications.

 

  • Static and Dynamic SIMS
  • Auger Electron Spectroscopy
  • Ion Beam Sputtering
  • Surface Science Studies
  • Rastering / Depth Profiling

 

The Hiden IG20 Ion Gun for static and dynamic SIMS, featuring:

 

  • Intense ion beam with 100 µm spot size and energies from 0.5 – 5 keV.
  • High current density, up to 4.5 mA/cm2.
  • Electron impact ion source with Argon and Oxygen capability.
  • Steering optics for line scattering and beam rastering in depth profiling.
  • 3° offset in the ion gun column for optimum rejection of neutrals.
  • Beam blanking facility for rapid beam switching in rastering applications.
  • Source differential pumping for reduced chamber gas load.
  • Easily replaceable twin filament assembly.
  • Sweep rates down to 64 µs.
  • Integrated operation with SIM and EQS probes for direct raster rate / area control.

 

 

Request Further Information and Pricing...

 

 

Brochures

 

icon IG20 Oxygen/Gas Gun (840K)

 

 

 

 

Application Notes

 

icon Fast Neutrals Analysis (302K)

icon Secondary Ion Mass Spectrometry - Glass Coatings (30K)

icon Secondary Neutrals Analysis (301K)

icon SIMS - Imaging of Semiconductor Contact Pads (493K)

icon SNMS - Depth Profile of Hard Drive Platter (560K)

icon Sputtered Neutral Mass Spectrometry - Magnetic Layers (89K)

icon Tour of the Hiden SIMS Workstation (6215K)

 

 

Product Specification

 

icon IG20 Ion Gun for Dynamic SIMS (61K)

 

 

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