Home Product Catalogue Plasma Characterisation EQP – Mass and Energy Analyser for Plasma Diagnostics
EQP – Mass and Energy Analyser for Plasma Diagnostics

Complete energy resolved mass speciation and mass resolved energy analysis of all species in your plasma


  • Positive ions, Negative Ions, Neutral Radicals and Neutrals analysis.
  • Etching / Deposition Studies
  • Ion implantation / Laser Ablation
  • Residual Gas Analysis / Leak Detection
  • Plasma electrode coupling - follow electrode conditions during operation. 
  • Analysis through a viewport, grounded electrode, driven electrode 


The Hiden EQP is a combined Mass / Energy analyser for the analysis of positive AND negative ions, neutrals, and radicals from plasma processes, featuring:


  • Software controlled Ion Extraction Optics for minimum plasma perturbation.
  • 45° Electrostatic Sector analyser, Scan Energy at 0.05 eV increments/ 0.25eV FWHM.
  • Minimum perturbation of ion flight path & constant ion transmission at all energies.
  • Differentially pumped Triple filter Quadrupole, mass range options to 2500amu.
  • High Sensitivity / Stability Pulse Ion Counting Detector with 7 decade dynamic range.
  • Tuneable integral ioniser for appearance potential MS with electron attachment option.
  • Penning Gauge and interlocks to provide over pressure protection.
  • Signal gating and programmable signal gating option for time resolved studies in pulsed plasma.
  • 1000eV Option, Floating option up to 10keV, Faraday Cup for high density plasmas.
  • Mu-Metal, Radio-metal shielding options, high pressure operation option.
  • MASsoft control via RS232, RS485 or Ethernet LAN.



Brochures


icon EQP Mass and Energy Plasma Analyser (3.3MB)

icon EQP Poster A3 size (254.23 KB)

icon EQP Poster A1 size (2.53 MB)





Application Notes


icon A Novel Method for the Study of Neutral Components of Processing Plasma (85K)

icon An Improved method for the Study of the Neutral Components of Processing Plasma (146K)

icon Characterisation of an ICP Reactor (I) (158K)

icon Characterisation of an ICP Reactor (2) (308K)

icon Energetic (Fast) Neutral Species Analysis (97K)

icon Energies of Ions Sampled Through a DC Biased RF Driven Electrode (185K)

icon Energy Distributions of Ions and Atoms from a Magnetron Source (173K)

icon EQP Diagnostic System Overview (200K)

icon EQP Radicals Sampled from a Plasma (107K)

icon EQP/EQS Time Resolved Studies in Ion Beam and Plasma Processes (246K)

icon Investigation of Plasmas at Atmospheric Pressures (236K)

icon Ion Energy Distribution in the Afterglow (336K)

icon Ion Energy Distributions of Positive Ions in an Argon Discharge (119K)

icon Mass Spectrometry of Processing Plasmas with the EQP/Mass Energy Analyser (105K)

icon The Energies of Positive and Negative Ions in an RF Plasma in Nitrous Oxide (147K)

icon Studies of Magnetron Sputter Deposition of Thin Films (103K) 



Technical Information


icon Data Control Inputs and Outputs and Special Applications (17K)

icon EQP and EQS Technical Information

icon EQP 1000 Series Probe Schematic (66K)

icon EQP 300/500 Series Probe Schematic (69K)

icon Programmable Signal Gating Module (217K)



Posters


icon Atmospheric Plasma Analysis by Molecular Beam MS (1377K)

icon Atmospheric Pressure Plasma Analysis ICPIG (256K)

icon Effects of Pulsing on the P-CFUBMS of CrAIN Coatings (3.6MB)

icon Ion Energy Distributions for a DC Plasma (144K)

icon Surface Analysis by Plasma Assisted Desorption Ionisation Mass Spectrometry (PADI-MS) (195K)



Gallery





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