Mass spectrometers for vacuum, gas, plasma and surface science

 

Quadrupole Mass Spectrometers for Thin Films and Surface Engineering

Plasma characterisation, plasma ion analysers and langmuir probes

Measures the concentration of gases and vapours in real time

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Mass range

200, 300 or 510 amu

Minimum detectable concentration

5 PPB

Maximum detectable concentration

100%

Sample inlet pressure

100mbar to 2bar abs

 

Options for sampling at pressures up to 30Bar

Response time to gas concentration change

300 milliseconds

Fast measurement speed

Up to 500 measurements per second

Sample flow required

Options for < 1 atm cc/min to 20 atm cc/min

 

Corrosive gas sampling options

Plasma characterisation, plasma ion analysers and langmuir probes

Thin film processing in research, development and functionalisation of surfaces has a broad application range in microelectronics, nanotechnology, solar, flat panel, mechanics, optics, photonics, textiles, coatings, chemistry, biology, and medicine.

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Overview

Thin film processing utilises a wide range of techniques, including :

Magnetron sputtering
ALD - atomic layer deposition
CVD - chemical vapour deposition
MOCVD - metal organic chemical vapor deposition
PECVD - plasma enhanced chemical vapor deposition
MBE - molecular beam epitaxial growth
RIE - plasma reactive ion etch
IBE/RIBE - ion beam etch and reactive ion beam etc


Each technique is often tailored for a specific application, requiring special process parameters to produce the surface/film properties required. Hiden mass spectrometers provide critical insight into thin film processing and characterisation enabling optimisation of thin film production and surface quality.

Hiden mass spectrometers are used for process control including SIMS end point detection of ion beam etch of magnetic thin films, III-V layers including gallium arsenide, and superconducting thin films including YBaCuO yttrium barium copper oxide, and for flux monitoring where precise control of film growth in MBE is required.

Residual gas analyzers are used for process monitoring and leak detection, offering a unique window into the vacuum processing environment. Analysis of the partial pressures of  vacuum residuals including water vapor, hydrocarbons, VOC's, and air leaks is routine.

The Hiden SIMS Workstation is used for post process analysis of thin films providing depth profiling and fine focus surface imaging of MBE grown thin films, glass coatings, magnetic thin films and metal oxides.
Hiden systems are individually configured to ensure optimum analyser response for sensitivity and speed.