Vacuum Process Analysis
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AP0002 - Surface Characteristics of Parylene-C Films in an Inductively Coupled O2/CF4 Gas Plasma

We investigated the degradation mechanism of OTFT performance in the plasma processing. In order to examine the origin of the degradation mechanism due to the plasma exposure, the relationships between operating parameters and plasma species should be analyzed for fabrication of high performance transistor in the plasma processing. So, we extracted the plasma species using quadrupole mass-spectrometry (QMS). Then, we applied this result for analyzing a degradation mechanism of OTFT devices. -

















