Thin films incorporating mixed metal and carbon elements (like carbon-metal nanocomposites or multilayer thin films) find applications as functional coatings in many fields of modern technology. A novel plasma assisted deposition method (namely sequential deposition), combining magnetron sputtering (MS) and plasma enhanced chemical vapor deposition (PECVD) was implemented. Using the same deposition setup, the sequential deposition method proved to be able in producing either a-C:H/W nanocomposite or carbon tungsten multilayers.
