The most advanced and reliable Langmuir Probe available for

Etching / Deposition / Cleaning Plasma Processes Pulsed plasma operation. Ion collection (Ni & Gi) Electron retardation (Te & EEDF) Electron collection (Ne). Plasma Potential. Debye Length, floating potential Ion flux

The ESPion advanced Langmuir probe for rapid, reliable and accurate plasma diagnostics for industry and academia, featuring:

• 15 scans per sec acquisition rate with D-O-E interface for auto, semi or manual analyses.
• Hiden pioneers in passive RF compensation, ESPion has the highest blocking impedance of any commercially available unit (4.25MOhm at 13.56 MHz cf. 100kOhm).
• Gas cooled multi-inductor chain for high temperature plasma operation is user replaceable for tuning to other frequencies.
• reference probe compensates for low frequency effects e.g. shift in the plasma potential (e.g. anodised chamber walls) or noise (e.g. power supply).
• ESPion the fastest pulsed plasma specifications of any commercial probe, ESPsoft contains all necessary gating circuitry as standard.
• 300, 600 or 915mm auto linear drive options, interlocked isolation valve, 90° probes, combined linear – rotary drives options available.
• Self-cleaning cycle to limit probe tip contamination.
• ESPsoft control via RS232, RS485 or Ethernet LAN.

ESPION Series - Advanced Langmuir Probes for Plasma Diagnostics (311K)

 Characterisation of an ICP Reactor (I) (158K)

 Characterisation of an ICP Reactor (2) (308K)

 ESPION Advanced Langmuir Probe (179K)

 ESPION Langmuir Probe for Time Resolved Measurements (336K)

 ESPION Advanced Langmuir Probe (347K)

 ESPION Probe Schematic (41K)

 ESPION Standard 300mm Z-Drive Schematic (81K)

 Introduction to High Pressure Langmuir Probe Analysis Techniques (184K)

 Introduction to Langmuir Probes (148K)

 Pulsed Plasma Operation with Hiden's ESPION Langmuir Probe (310K)

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