Plasma Etching

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In Situ Characterization of Residues Formed on a Plasma-Etching Chamber 279.87 KB

In situ characterization of residues formed on a plasma-etching chamber. ...
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Identification of volatile products in low pressure hydrocarbon electron resonance reactive ion etching of InP and GaAs. 566.31 KB

Identification of volatile products in low pressure hydrocarbon electron resonance...
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Highly anisotropic gate electrode patterning in neutral beam etching using F2 gas chemistry. 236.40 KB

Highly anisotropic gate electrode patterning in neutral beam etching using F2 gas...
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High density plasma etching of low k dielectric polymers in oxygen-based chemistries. 360.22 KB

High density plasma etching of low k dielectric polymers in oxygen-based chemistries. ...
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Generating high-efficiency neutral beams by using negative ions in an inductively coupled plasma source. 757.83 KB

Generating high-efficiency neutral beams by using negative ions in an inductively...
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Evaluation of silicon oxide cleaning using F2/Ar remote plasma processing. 187.08 KB

Evaluation of silicon oxide cleaning using F2/Ar remote plasma processing. ...
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Dry etching of (Pb,Sr) TiO3 thin films using inductively coupled plasma. 149.55 KB

Dry etching of (Pb,Sr) TiO3 thin films using inductively coupled plasma. ...
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Dry etching of (Ba,Sr)TiO3 thin films using an inductively coupled plasma. 155.95 KB

Dry etching of (Ba,Sr)TiO3 thin films using an inductively coupled plasma. ...
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Dependence of SiO2 etch rate on sidewall angle as affected by bottom materials in a high-density CHF3 plasma. 270.67 KB

Dependence of SiO2 etch rate on sidewall angle as affected by bottom materials in...
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Control of surface reactions in high-performance SiO2 etching. 759.40 KB

Control of surface reactions in high-performance SiO2 etching. ...