Vacuum Process Gas Analysers for CVD / MOCVD / ALD
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For direct information on gas reactions in process monitoring
Gas reaction kinetics studies and gas composition measurements are of vital importance in the process development and monitoring of chemical vapour deposition processes.
Related Products
Application areas include growth of hard coatings, solar cells, diamond, DLC, nitrides, III-V’s and II-VI materials.
Hiden gas and plasma analysers include special sampling technology enabling high sensitivity analysis of the critical species in most CVD techniques including hot filament CVD, plasma enhanced CVD, ALD and MOCVD.
SIMS is a high sensitivity surface analysis technique applied to CVD grown thin films.
Mass Spectrometers for Surface Analysis
ALD Atomic Layer Deposition – Vacuum Processing of Thin Films
Sampling Inlets for Hiden Mass Spectrometers: Gas, Vapour and Liquid Sampling Systems
Mass Spectrometers for Gas Analysis Applications
High Performance Mass Spectrometers for Vacuum and Semiconductor Process Monitoring
Analytic Methods for ALD Technologies
Hiden HPR-20 R&D for Advanced Research
Hiden EQP Mass/Energy Analyser for Plasma Diagnostics and Characterisation (Introduction)
Hiden EQP Applications Mass/Energy Analyser for Plasma Diagnostics and Characterisation
Hiden ESPion Advanced Langmuir Probe for Plasma Diagnostics & Characterisation
Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al2O3 Films on Metallic Ti Substrates 4.18 MB 3 downloads
Combination of Multiple Operando and In-Situ CharacterizationTechniques in a Single...
Reductive Thermal Atomic Layer Deposition Process for Gold 10.14 MB 12 downloads
Reductive Thermal Atomic Layer Deposition Process for Gold ...
Spatially-Modulated Silicon Interface Energetics Via Hydrogen Plasma-Assisted Atomic Layer Deposition of Ultrathin Alumina 2.33 MB 13 downloads
Spatially-Modulated Silicon Interface Energetics Via Hydrogen Plasma-Assisted Atomic...
A Secondary Reaction Pathway for the Alumina Atomic Layer Deposition Process with Trimethylaluminum and Water, Revealed by Full-Range, Time-Resolved In Situ Mass Spectrometry 4.22 MB 21 downloads
A Secondary Reaction Pathway for the Alumina Atomic Layer Deposition Process with...
Carbon incorporation in MOCVD of MoS2 thin films grown from organosulfide precursor 4.17 MB 22 downloads
Carbon incorporation in MOCVD of MoS2 thin films grown from organosulfide precursor ...
SWCNT growth on Al/Fe/Mo investigated by in situ mass spectroscopy. 1.61 MB 36 downloads
SWCNT growth on Al/Fe/Mo investigated by in situ mass spectroscopy. ...
In situ characterisation of atomic layer deposition of titanium dioxide from titanium isopropoxide and water. 223.92 KB 41 downloads
In situ characterisation of atomic layer deposition of titanium dioxide from titanium...
