Nanotechnology

Nanotechnology (nanotech) has existed in a theoretical sense for decades; even before scientists and engineers were able to exploit and study materials at the atomic and molecular levels. This nanoscale concerns a range of approximately 1 – 100 nanometres (nm), which spans as low as one billionth of a meter (10^-9 m). Conventional technologies were unable to resolve points within 200nm of one another, inhibiting the realisation of nanotechnology and nanoscale surface analysis.

The onset of modern instrumentation like the atomic force and scanning electron microscopes (AFM/SEMs) opened a window into the atomic, molecular, and macromolecular properties of materials. This enabled research and development (R&D) of unique nanostructures, and nanoscale localities on macrostructural materials, leading to a host of new nanotechnology applications.

Nanotechnology Applications of Hiden Analytical Instruments

Surface and Thin-film Analysis

Nanotechnology relies on the precise control of surface and thin-film properties. Hiden’s Secondary Ion Mass Spectrometry (SIMS) and Secondary Neutral Mass Spectrometry (SNMS) products are used for:

• Depth profiling: Hiden’s SIMS Workstations analyse the layered structure and composition of nanoscale thin films with high resolution. This is critical for optimising multi-layered nanodevices like solar cells and semiconductors.
• Surface contamination and composition: Researchers use SIMS to detect minute surface impurities or analyse the elemental makeup of the top atomic layers of a material. This ensures quality control in the manufacturing of nanoscale components, where even a single atomic layer of contamination can cause device failure.
• Nanoscale imaging: Focused Ion Beam SIMS (FIB-SIMS) provides high-sensitivity, three-dimensional elemental mapping of nano-materials. This allows researchers to study complex structures, track dopant distribution in semiconductors, or investigate battery components at the micro- and nanoscale.

Plasma Diagnostics and Nanofabrication

Plasma is used in processes such as plasma etching and chemical vapor deposition (CVD), which are essential for manufacturing nanoscale structures. Hiden products help researchers characterise and control these processes.

• Analysing plasma species: The HPR-60 Molecular Beam Mass Spectrometer (MBMS) is used for the real-time, in-situ analysis of reactive species, positive and negative ions, and radicals within a plasma reactor.
• Optimising fabrication parameters: By understanding the chemistry of the plasma, researchers can fine-tune fabrication processes such as atomic layer deposition (ALD) to control film thickness and minimise impurities.
• Diagnosing plasma properties: Langmuir probes, such as the ESPion, measure key electrical properties of the plasma, including ion density and electron temperature, which ensures process stability and reproducibility.

Gas and Reaction Analysis

In research involving nanoparticle synthesis, catalysis, and new energy systems, Hiden’s gas analysis tools monitor chemical reactions at the nanoscale.

• Catalysis and surface science: The CATLAB system is used to study surface reactions and the performance of nanoparticle catalysts. It can track the degradation of nanoparticles and support the development of materials for clean energy applications.
• Precursor gas monitoring: In processes like ALD and CVD, systems like the HPR-30 monitor the purity and flow of precursor gases to ensure precise, atomic-level deposition.
• High-mass particle detection: Hiden’s high-mass-range quadrupole systems (up to 20,000 amu) can detect larger clusters and small nanoparticles. This is valuable for applications in nanoparticle filtration and aerosol analysis.