Vacuum Process Gas Analysers for CVD / MOCVD / ALD Archives - Page 3 of 3

A Secondary Reaction Pathway for the Alumina Atomic Layer Deposition Process with Trimethylaluminum and Water, Revealed by Full-Range, Time-Resolved In Situ Mass Spectrometry

by Caroline Wardropper | Jan 17, 2022

A Secondary Reaction Pathway for the Alumina Atomic Layer Deposition Process with Trimethylaluminum and Water, Revealed by Full-Range, Time-Resolved In Situ Mass Spectrometry

Carbon incorporation in MOCVD of MoS2 thin films grown from organosulfide precursor

by Caroline Wardropper | Jan 7, 2022

Carbon incorporation in MOCVD of MoS2 thin films grown from organosulfide precursor

SWCNT growth on Al/Fe/Mo investigated by in situ mass spectroscopy.

by hiden | Aug 25, 2016

SWCNT growth on Al/Fe/Mo investigated by in situ mass spectroscopy.

In situ characterisation of atomic layer deposition of titanium dioxide from titanium isopropoxide and water.

by hiden | Aug 25, 2016

In situ characterisation of atomic layer deposition of titanium dioxide from titanium isopropoxide and water.

Growth mechanisms of carbon nanofilaments on Ni-loaded diamond catalyst.

by hiden | Aug 25, 2016

Growth mechanisms of carbon nanofilaments on Ni-loaded diamond catalyst.

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A Secondary Reaction Pathway for the Alumina Atomic Layer Deposition Process with Trimethylaluminum and Water, Revealed by Full-Range, Time-Resolved In Situ Mass Spectrometry

Carbon incorporation in MOCVD of MoS2 thin films grown from organosulfide precursor

SWCNT growth on Al/Fe/Mo investigated by in situ mass spectroscopy.

In situ characterisation of atomic layer deposition of titanium dioxide from titanium isopropoxide and water.

Growth mechanisms of carbon nanofilaments on Ni-loaded diamond catalyst.

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