Effect of asynchronous pulsing parameters on the structure and properties of CrAlN films deposited by pulsed closed field unbalanced magnetron sputtering (P-CFUBMS).

Aug 25, 2016

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Effect of asynchronous pulsing parameters on the structure and properties of CrAlN films deposited by pulsed closed field unbalanced magnetron sputtering (P-CFUBMS).

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Effect of asynchronous pulsing parameters on the structure and properties of CrAlN films deposited by pulsed closed field unbalanced magnetron sputtering (P-CFUBMS).

Effect of asynchronous pulsing parameters on the structure and properties of CrAlN films deposited by pulsed closed field unbalanced magnetron sputtering (P-CFUBMS).

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