Effects of the substrate to chamber wall distance on the structure and properties of CrAlN films deposited by pulsed-closed field unbalanced magnetron sputtering (P-CFUBMS).

Aug 25, 2016

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Effects of the substrate to chamber wall distance on the structure and properties of CrAlN films deposited by pulsed-closed field unbalanced magnetron sputtering (P-CFUBMS).

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Effects of the substrate to chamber wall distance on the structure and properties of CrAlN films deposited by pulsed-closed field unbalanced magnetron sputtering (P-CFUBMS).

Effects of the substrate to chamber wall distance on the structure and properties of CrAlN films deposited by pulsed-closed field unbalanced magnetron sputtering (P-CFUBMS).

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