Etching characteristics and mechanism of Au thin films in inductively coupled Cl2/Ar plasma.

Aug 25, 2016

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Etching characteristics and mechanism of Au thin films in inductively coupled Cl2/Ar plasma.

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Etching characteristics and mechanism of Au thin films in inductively coupled Cl2/Ar plasma.

Etching characteristics and mechanism of Au thin films in inductively coupled Cl2/Ar plasma.

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