Select Page
Download is available until [expire_date]
  • Version
  • Download 72
  • File Size 1.03 MB
  • File Count 1
  • Create Date October 4, 2016
  • Last Updated October 4, 2016

Mass Spectrometers for Thin Films, Plasma and Surface Engineering

Thin film processing in research, development and functionalisation of surfaces has a broad application range in microelectronics, nanotechnology, solar, flat panel, mechanics, optics, photonics, textiles, coatings, chemistry, biology, and medicine. Thin film processing utilises a wide range of techniques, including: Magnetron sputtering ALD - atomic layer deposition CVD - chemical vapour deposition MOCVD - metal organic chemical vapour deposition PECVD - plasma enhanced chemical vapour deposition MBE - molecular beam epitaxial growth RIE - plasma reactive ion etch IBE/RIBE - ion beam etch and reactive ion beam etch