Mass Spectrometers for Thin Films, Plasma and Surface Engineering

File Size1.03 MB
Create Date4th October 2016

Thin film processing in research, development and functionalisation of surfaces has a broad application range in microelectronics, nanotechnology, solar, flat panel, mechanics, optics, photonics, textiles, coatings, chemistry, biology, and medicine. Thin film processing utilises a wide range of techniques, including: Magnetron sputtering ALD - atomic layer deposition CVD - chemical vapour deposition MOCVD - metal organic chemical vapour deposition PECVD - plasma enhanced chemical vapour deposition MBE - molecular beam epitaxial growth RIE - plasma reactive ion etch IBE/RIBE - ion beam etch and reactive ion beam etch