Hiden Analytical will be attending the 46th International Symposium on Dry Process from 13-14 November 2025, at the Shiki Museum, Matsuyama, Ehime, Japan.
Founded over four decades ago, the symposium offers a valuable forum for in-depth discussion among professionals and students working in this exciting field. It covers all aspects of the rapidly evolving fields of dry processes—such as plasma etching and deposition, diagnostics and modelling of plasmas and surfaces, and surface modifications by plasmas—applied in microelectronics, power devices, sensors, environmental protection, biological systems, and medicine.
What to expect?
Cutting-edge dry process research: Explore the latest developments in plasma etching, deposition, and surface modification technologies.
Focus on advanced materials and applications: Topics include microelectronics, power devices, sensors, environmental protection, and biomedical applications.
Technical sessions and presentations: Researchers and industry professionals will share insights into plasma diagnostics, modelling, and new surface treatment techniques.
Networking opportunities: Connect with global experts, students, and companies driving innovation in plasma and vacuum technologies.
Hiden Analytical at DPS2025:
We are delighted to share that Yoshiaki Watanabe of Innovation Science will be representing Hiden Analytical at the symposium. Attendees will be able to visit Yoshiaki at the booth and discover how Hiden’s instrumentation can provide solutions in vacuum process gas analysis, plasma etch and deposition monitoring, and surface and thin-film diagnostics via residual gas and vacuum-system analysis.
📅 Event Dates: 13-14 November 2025.
📍 Location: Shiki Museum, Matsuyama, Ehime, Japan.
🔗 Event Website: DPS2025
We’re ready to engage with the community, share our portfolio of vacuum/residual gas analytics tools, and help drive the next wave of innovation in plasma-based processing and surface engineering!
🔍 Explore more about our upcoming exhibitions & conferences.
