Hiden Analytical will join forces with Scia Systems for a joint technical presentation at Plasma4Production 2025, taking place on 16 September 2025 in Traunreut, Germany.
The talk, “(R)IBE Systems and Their Application for the Structuring of TMR Sensor Elements”, will explore the use of (Reactive) Ion Beam Etching (RIBE) in the precision fabrication of Tunnel Magnetoresistance (TMR) sensors — critical components for advanced magnetic sensing applications.
Representing Hiden Analytical, Matt Wilding, Senior Test & Installation Engineer in our Plasma & Surface Analysis Division, brings over 14 years of expertise in ion beam etch end point detection for high-specification device production. His work supports industries including:
Magnetic thin films
High temperature superconductors
III-V semiconductors
This collaboration will combine Hiden Analytical’s expertise in real-time process monitoring and end point detection with Scia Systems’ advanced ion beam and plasma processing technologies — offering attendees a comprehensive look at how integrated solutions can improve etch process accuracy, repeatability, and productivity in modern manufacturing.
📅 Event Date: 16 September 2025
📍 Location: Traunreut, Germany
We look forward to contributing to the Plasma4Production programme and engaging with the plasma processing community on the latest advances in ion beam technology for sensor fabrication.
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