A residual gas analyser for vacuum process analysis
The HPR-30 is a residual gas analyser configured for analysis of gases and vapours in vacuum processes and for vacuum diagnostics. The system is fully configurable for individual process applications such as CVD, plasma etching, MOCVD, process gas purity and in-process contaminant monitoring.
The HPR-30 sampling system configuration is for fast response high sensitivity analysis of gas and vapour species in vacuum processes.It is also directly suited to analysis of high mass species and precursors used in ALD and MOCVD applications.
The HPR-30 system features a close-coupled re-entrant aperture for sampling directly within the process region, providing maximum data integrity and fast confirmation of process status. Options include the innovative Hiden 3F series triple filter quadrupole system providing enhanced abundance sensitivity, part-per-billion (ppb) detection levels and high contamination resistance, particularly suited to the analysis of aggressive gases in CVD and RIE applications.
- Triple filter mass spectrometer
- Mass range options 200, 300, 500 or 1000 amu
- Enhanced abundance sensitivity
- Detection to 5 ppb
- APSI-MS soft ionisation mode
The system is supplied with MASsoft 7 Professional Edition software.
This Windows 8 compatible software allows control of the instrument via USB 2.0, RS232 or Ethernet. Provides comprehensive I/O for data output and for reading data from external devices for integration and display with mass spectrometer data.
Customer StoriesAP0002 - Surface Characteristics of Parylene-C Films in an Inductively Coupled O2/CF4 Gas Plasma (211 KB)