Semiconductor
For advanced manufacturing processes
Hiden Analytical mass spectrometers and Langmuir probes are used in a wide range of applications for research and production in the semiconductor industry. Residual gas analysers, RGA provide for vacuum diagnostics, contamination monitoring, leak detection and process gas analysis.
RGA – Residual Gas Analysis
Hiden RGA Series, HPR-30 and HMT products provide for vacuum diagnostics, contamination monitoring, leak detection and process gas analysis. Hiden RGA systems are offered for analysis in most semiconductor processes including ALD, MBE, CVD, PECVD, MOCVD, RIE and IBE.SIMS-end point
Hiden’s IMP-EPD system is used by the world’s largest manufacturers of hard disc drives for precise control of the end point in the ion beam etch step in the production of read/write heads. End point detection on the nano scale is demanded by the latest device technology.
SIMS and TPD surface analysis
Hiden’s SIMS Workstation provides for depth profiling and imaging of the upper most layers of semiconductor devices. Hiden’s TDSLab Series is a temperature programmed desorption system for the analysis of gas and vapour out gassing and diffusion over the temperature range from ambient to 1000oC.
Plasma Characterisation
Hiden’s EQP mass energy analyser provides for analysis of positive and negative ions, neutrals and neutral radicals. EQP systems are tailored to specific plasma processes with options for magnetic shielding for magnetically confined plasma and programmable signal gating for time resolved studies in pulsed plasma processes for example. The Hiden PSM mass energy analyser is a simplified version of the EQP offering positive ion analysis and RGA functions for plasma process diagnostics. Hiden’s ESPion Langmuir probes provide for detailed analysis of the electrical characteristics of plasma including the plasma ion and electron densities, plasma potential and electron temperature.