Semiconductor
For advanced manufacturing processes
Hiden Analytical mass spectrometers and Langmuir probes are used in a wide range of applications for research and production in the semiconductor industry. Residual gas analysers, RGA provide for vacuum diagnostics, contamination monitoring, leak detection and process gas analysis.
Hiden Analytical is a leading manufacturer of Secondary Ion Mass Spectrometer (SIMS) analysers designed for end point detection in hard disk drive production and advanced semiconductor manufacturing. Hiden’s SIMS and Temperature Programmed Desorption (TPD) surface analysis systems deliver precise diagnostics and in-depth surface characterization for the world’s leading semiconductor makers and R&D facilities.
Plasma-based semiconductor processes such as deposition and etching demand cutting-edge analytical tools. Hiden’s mass/energy analysers and Langmuir probes provide detailed insight into reaction kinetics, empowering plasma researchers to optimize both existing and emerging processes with accuracy and reliability.
Residual Gas Analysis (RGA) for Semiconductor Manufacturing
Hiden’s RGA Series, HPR-30 and HMT instruments, are trusted solutions for:
- Vacuum diagnostics
- Contamination monitoring
- Leak detection
- Process gas analysis
Our RGA systems support analysis in a wide range of semiconductor process environments:
- Atomic Layer Deposition (ALD)
- Molecular Beam Epitaxy (MBE)
- Chemical Vapor Deposition (CVD)
- Plasma-Enhanced Chemical Vapor Deposition (PECVD)
- Metal-Organic Chemical Vapor Deposition (MOCVD)
- Reactive Ion Etching (RIE)
- Ion Beam Etching (IBE)
Nanoscale End Point Detection for Ion Beam Etching:
For precision manufacturing, Hiden’s IMP-EPD system delivers nano-scale end point detection for ion beam etch steps in the production of hard disk drive read/write heads. The latest device technologies demand real-time etching control, and the IMP-EPD is the tool of choice for the world’s largest hard disk drive manufacturers.
To further enhance productivity, the Hiden EP-Replayer allows engineers to replay previous etch data, optimize end point recipes, and simulate detection in real time using algorithmic recipe templates.
SIMS and TPD Surface Analysis Solutions
- Hiden SIMS Workstation: Provides depth profiling and surface imaging of the uppermost layers of semiconductor devices for failure analysis and device characterization.
- Hiden TDSLab Series: A temperature programmed desorption system for studying outgassing, gas diffusion, and vapor release over temperatures ranging from ambient to 1000°C.
Plasma Characterisation with Mass Energy Analysers and Langmuir Probes
Hiden’s EQP Mass Energy Analyser enables advanced plasma research through:
- Positive and negative ion analysis
- Neutral and radical species detection
Options include:
- Configurable magnetic shielding for magnetically confined plasmas
- Programmable signal gating for time-resolved studies in pulsed plasma processes
For streamlined diagnostics, the Hiden PSM Mass Energy Analyser offers a simplified toolset for positive ion analysis and integrated RGA functions.
Our ESPion Langmuir Probes deliver detailed plasma diagnostics including:
- Plasma ion and electron densities
- Electron temperature measurements
- Plasma potential analysis
