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An advanced Langmuir probe for plasma diagnostics
Routine monitoring of the I-V plasma characteristic by the Hiden ESPion probe gives direct information relating to plasma stability and reproducibility. Automatic real-time extrapolation of plasma parameters gives detailed information on plasma properties for use in characterisation and uniformity monitoring.
AP-ESPion-202115 – Time resolved plasma diagnostics for pulsed 2.45 GHz hydrogen discharges
AP-ESPion-202111 – HiPIMS deposition of conductive, infrared transparent tin oxide films for high performance electronic applications
AP-ESPion-202106 – Experimental and numerical study of a RF plasma source in a DC-grounded electrode configuration
AP-ESP-0001 Time resolved Langmuir probe diagnostics for ECR plasma research
AP0067 – O- Density Measurements in the Pulsed-DC Reactive Magnetron Sputtering of Titanium (215 KB)
AP0121 – Hiden ESPion Plasma Probe Measurements on a Hollow-Cathode Based Large-Volume Plasma Source (277 KB)
AP0142 – Ion Density Increase in High Power Twin-cathode Magnetron System (247 KB)
The system is supplied with ESPionSoft software.
This Windows 10 and Windows 11 compatible software allows control of the instrument via USB 2.0, RS232 or Ethernet. Provides comprehensive I/O for data output and for reading data from external devices for integration and display with Langmuir probe data.