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Plasma Characterisation

plasma characterisation

For further information and pricing, please get in touch with us.

Plasma characterisation, plasma ion analysers and langmuir probes

Hiden plasma probes measure some of the key plasma parameters and provide detailed information relating to plasma reaction chemistry.

Overview

A wide range of industrial processes use electrical plasmas, and new applications are developing rapidly. In the microelectronics industry the demands of higher yields and shrinking device geometries mean that process reproducibility and understanding is vital.

Detailed understanding of the reaction kinetics of plasma ions and neutral species plays a key role in the development of advanced surface engineering processes such as HIPIMS.

Further Reading

Hiden EQP and PSM mass/energy analysers are offered with a range of standard sampling options to provide for plasma characterisation in a broad range of applications including :

ECR – Electron Cyclic Resonance

Electron Cyclotron Resonance plasma is used for chemical vapour deposition, CVD and etching in semiconductor processing. Magnetic shielding of the EQP and PSM Mass/Energy Analyser enables operation in the high magnetic field environment produced by the ECR plasma source. EQP Mass and energy analyser for plasma diagnostics PSM Series Advanced Plasma Sampling Mass Spectrometers

Magnetron Sputtering

Magnetron sputtering is for plasma vapour deposition and is available in DC and RF forms producing a range of thin films used in many industries including decorative coatings, hard disk drive platters , optoelectronics and solar cells.

High Power Impulse Magnetron Sputtering (HIPIMS)

Pulsed plasma provide high density plasma for adhesion enhancing pre-treatment of the substrate prior to coating deposition (substrate etching) and deposition of thin films with high microstructure density. Hiden’s data acquisition system provides for time resolved data acquisition across the plasma pulse providing mass resolved ion energy information for positive and negative ions.

Inductively Coupled Plasma (ICP) and RF Plasma

ICP and RF plasma are used for many applications including reactive ion etching of thin films. Hiden’s advanced Langmuir probe system, ESPion includes RF compensation circuits to enable operation and data collection from within the plasma RF environment. ESPion Advanced langmuir probe for plasma diagnostics.

Dielectric Barrier Discharge (DBD)

DBD plasma sources are widely used for surface modification at atmospheric plasma. Hiden’s HPR-60 molecular beam sampling system provides for mass and enrgy analysis of plasma ions, neutra

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Development of a compact helicon plasma source with two sets of ring array permanent magnets for the study of blue core plasma 8.05 MB 5 downloads

Development of a compact helicon plasma source with two sets of ring array permanent...
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A pulsed hollow cathode discharge operated in an Ar/N2/O2 gas mixture and the formation of nitric oxide. 1.69 MB 7 downloads

A pulsed hollow cathode discharge operated in an Ar/N2/O2 gas mixture and the formation...
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Mass spectroscopic measurement of time-varying ion composition in a pulse-modulated Ar/C4 F8 /O2 dual-frequency capacitively coupled plasma 1.02 MB 14 downloads

Mass spectroscopic measurement of time-varying ion composition in a pulse-modulated...
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Mass spectroscopy of oxygen plasmas with energetic ions 5.06 MB 22 downloads

Mass spectroscopy of oxygen plasmas with energetic ions ...
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Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma 3.98 MB 12 downloads

Refined Appearance Potential Mass Spectrometry for High Precision Radical Density...
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Ion energy distribution of plasma ions of a hollow cathode discharge in Ar + N2 and Ar + O2 gas mixtures 732.02 KB 12 downloads

Ion energy distribution of plasma ions of a hollow cathode discharge in Ar + N2 and...
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Estimation of Vibrational Temperatures of N2 and CO2 in Low-Pressure Electron Cyclotron Resonance Plasmas by Threshold Ionization Mass Spectrometry 623.48 KB 9 downloads

Estimation of Vibrational Temperatures of N2 and CO2 in Low-Pressure Electron Cyclotron...
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Chamber with Inverted Electrode Geometry for Measuring and Control of Ion Flux-Energy Distribution Functions 3.39 MB 11 downloads

Chamber with Inverted Electrode Geometry for Measuring and Control of Ion Flux-Energy...