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Plasma Characterisation

plasma characterisation

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Plasma characterisation, plasma ion analysers and langmuir probes

Hiden plasma probes measure some of the key plasma parameters and provide detailed information relating to plasma reaction chemistry.

Overview

A wide range of industrial processes use electrical plasmas, and new applications are developing rapidly. In the microelectronics industry the demands of higher yields and shrinking device geometries mean that process reproducibility and understanding is vital.

Detailed understanding of the reaction kinetics of plasma ions and neutral species plays a key role in the development of advanced surface engineering processes such as HIPIMS.

Further Reading

Hiden EQP and PSM mass/energy analysers are offered with a range of standard sampling options to provide for plasma characterisation in a broad range of applications including :

ECR – Electron Cyclic Resonance

Electron Cyclotron Resonance plasma is used for chemical vapour deposition, CVD and etching in semiconductor processing. Magnetic shielding of the EQP and PSM Mass/Energy Analyser enables operation in the high magnetic field environment produced by the ECR plasma source. EQP Mass and energy analyser for plasma diagnostics PSM Series Advanced Plasma Sampling Mass Spectrometers

Magnetron Sputtering

Magnetron sputtering is for plasma vapour deposition and is available in DC and RF forms producing a range of thin films used in many industries including decorative coatings, hard disk drive platters , optoelectronics and solar cells.

High Power Impulse Magnetron Sputtering (HIPIMS)

Pulsed plasma provide high density plasma for adhesion enhancing pre-treatment of the substrate prior to coating deposition (substrate etching) and deposition of thin films with high microstructure density. Hiden’s data acquisition system provides for time resolved data acquisition across the plasma pulse providing mass resolved ion energy information for positive and negative ions.

Inductively Coupled Plasma (ICP) and RF Plasma

ICP and RF plasma are used for many applications including reactive ion etching of thin films. Hiden’s advanced Langmuir probe system, ESPion includes RF compensation circuits to enable operation and data collection from within the plasma RF environment. ESPion Advanced langmuir probe for plasma diagnostics.

Dielectric Barrier Discharge (DBD)

DBD plasma sources are widely used for surface modification at atmospheric plasma. Hiden’s HPR-60 molecular beam sampling system provides for mass and enrgy analysis of plasma ions, neutra

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Pressure and Input Power Dependence of Ar/N2H2 Inductively Coupled Plasma Systems 215.84 KB 26 downloads

Pressure and input power dependence of Ar/N2H2 inductively coupled plasma systems. ...
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Positive Sheath Behaviour in Low Pressure Argon Plasma 206.17 KB 24 downloads

Positive sheath behaviour in low pressure Argon plasma. ...
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Plasma Implanted Ultra Shallow Junction Boron Depth Profiles: Effect of Plasma... 618.05 KB 16 downloads

Plasma implanted ultra shallow junction boron depth profiles: Effect of plasma chemistry...
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Plasma Diagnostics in Large Area Plasma Processing System 111.14 KB 20 downloads

Plasma diagnostics in large area plasma processing system ...
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Optical Emission Spectroscopy and Energy-Resolved Mass Spectroscopy in Pulsed DC Magentron.. 290.55 KB 26 downloads

Optical emission spectroscopy and energy-resolved mass spectroscopy in pulsed DC...
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On the Extraction of Positive & Negative Ions from Electron-Beam-Generated Plasmas 1.71 MB 22 downloads

On the extraction of positive & negative ions from electron-beam-generated plasmas. ...
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Mass Spectrometric Studies of Plasmas used for Surface Treatment 293.79 KB 21 downloads

Mass-resolved Ion Energy Distributions in Continuous Dual Mode Microwave/Radio Frequency...
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Low Energy Ion Implantation using Non-Equilibrium Glow Discharge 1.25 MB 21 downloads

Low energy ion implantation using non-equilibrium glow discharge. ...
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Ion Energy Distributions in a Pulsed, Electron Beam-Generated Plasma 224.11 KB 15 downloads

Ion energy distributions in a pulsed, electron beam-generated plasma. ...
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Investigation of inductively coupled Ar and CH4/Ar plasmas and the effect of ion energy on DLC film properties. 2.21 MB 17 downloads

Investigation of inductively coupled Ar and CH4/Ar plasmas and the effect of ion...