HPR-30 Series
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Residual gas analysis systems for vacuum process analysis
The HPR-30 Series are residual gas analysis systems configured for analysis of gases and vapours in vacuum processes and for vacuum diagnostics with sampling capability from high vacuum to atmospheric pressure. The systems are fully configurable for individual process applications such as CVD, ALD, plasma etching, MOCVD, process gas purity and in-process contaminant monitoring.
Applications
The HPR-30 Series systems specialise in rapid and highly sensitive analysis of gases and vapors in vacuum processes. They are integral for tasks like leak detection, monitoring for contamination, analyzing process trends, and evaluating high mass species and precursors, particularly in applications such as ALD and MOCVD.
The sampling configurations available are:
HPR-30 Cart: Equipped with dual conductance sampling inlet, it boasts a directly connected re-entrant aperture for sampling within the process zone. This ensures unparalleled data accuracy and quick process status verification.
HPR-30 Multi Inlet Cart: Features several adaptable inlets, each 1m in length, paired with a tri-valve manifold connection. It has automated switching that facilitates analysis across a wide process pressure spectrum.
HPR-30 SGL: Designed with a single, heated sampling line, this is perfect for scenarios with limited space for sampling links. Especially when the analysis of less volatile byproducts requires a consistently heated inlet. Additionally, it offers the option of time-resolved data collection, making it ideal for monitoring pulsed deposition processes.
An advanced feature available is the Hiden 3F series triple filter quadrupole system. This offers enhanced sensitivity, with detection levels down to the ppb scale, and superior resistance to contamination. This makes it especially powerful for analyzing harsh gases in CVD and RIE applications.
Plasma Etch in Microtechnology
High Performance Mass Spectrometers for Vacuum and Semiconductor Process Monitoring
Mass Spectrometers for Thin Films, Plasma and Surface Engineering
Sampling Inlets for Hiden Mass Spectrometers: Gas, Vapour and Liquid Sampling Systems
ALD Atomic Layer Deposition – Vacuum Processing of Thin Films
AN-10040 | Gas Analysis | HPR-30| Using the HPR-30 to monitor the ALD process
The system are supplied with MASsoft Professional software.
This Windows 10 and Windows 11 compatible software allows control of the instrument via USB 2.0, RS232 or Ethernet. Provides comprehensive I/O for data output and for reading data from external devices for integration and display with mass spectrometer data.
The iRGA software is a new and intuitive application for routine vacuum monitoring. It is designed to be simple and automatic.
- automatically provides partial pressure data for the common residual gas and vapours, including hydrogen, helium, water, nitrogen, oxygen, argon and a custom gas.
- includes a new tablet view where the background colour changes depending on alarm condition
- includes a trend view, scan, leak detection and maintenance modes
- includes alarm function to send alerts to internal I/O, Wi-Fi and by email
