Low Pressure Plasma
HiPIMS
Enhance Component Performance with Titanium Nitride Deposition using HiPIMS
Diamond-Like Carbon (DLC) Coating
Advanced Surface Solutions for High-Performance Applications.
Plasma Etching and Atomic Layer Etching (ALE)
Monitor both the fluxes of radicals and ions and their energies in real time.
Pulsed Laser Deposition (PLD) Coatings
A Highly Versatile and Efficient Technique for Creating Thin Film Coatings.
DC Magnetron Deposition of SiBCN Films
Discover the Advantages of DC Magnetron Deposition of Silicoboron-carbonitride (SiBCN) Films for Microelectronics Applications
Plasma Enhanced Atomic Layer Deposition (PEALD)
A cutting-edge technique for creating ultra-thin, highly uniform coatings of materials such as Titanium Nitride (TiN).
