IMP-EPD
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A system for ion etch control and optimum process quality
The IMP-EPD is a differentially pumped, ruggedised secondary ion mass spectrometer for the analysis of secondary ions from the ion beam etch process. The system includes integrated software with process specific algorithms developed for optimum process control.
Applications
The IMP-EPD is a differentially pumped, ruggedised secondary ion mass spectrometer for the analysis of secondary ions from the ion beam etch process. The system includes integrated software with process specific algorithms developed for optimum process control.
The IMP-EPD system is process proven for the production of high specification thin film devices for applications including magnetic thin films, high temperature superconductors and III-V semiconductors.
- IBM Almaden Research Center | Advanced Instrumentation | Nanodevice Fabrication : Ion Beam Nano-Fabrication
- Nanyang Technological University | Spintronics device research group
The system is supplied with MASsoft Professional Edition software.
This Windows 10 and Windows 11 compatible software allows control of the instrument via USB 2.0, RS232 or Ethernet. Provides comprehensive I/O for data output and for reading data from external devices for integration and display with mass spectrometer data.
