Vacuum Process Gas Analysers for CVD / MOCVD / ALD
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For direct information on gas reactions in process monitoring
Gas reaction kinetics studies and gas composition measurements are of vital importance in the process development and monitoring of chemical vapour deposition processes.
Application areas include growth of hard coatings, solar cells, diamond, DLC, nitrides, III-V’s and II-VI materials.
Hiden gas and plasma analysers include special sampling technology enabling high sensitivity analysis of the critical species in most CVD techniques including hot filament CVD, plasma enhanced CVD, ALD and MOCVD.
SIMS is a high sensitivity surface analysis technique applied to CVD grown thin films.
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