Vacuum Process Gas Analysers for CVD / MOCVD / ALD
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For direct information on gas reactions in process monitoring
Gas reaction kinetics studies and gas composition measurements are of vital importance in the process development and monitoring of chemical vapour deposition processes.
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Application areas include growth of hard coatings, solar cells, diamond, DLC, nitrides, III-V’s and II-VI materials.
Hiden gas and plasma analysers include special sampling technology enabling high sensitivity analysis of the critical species in most CVD techniques including hot filament CVD, plasma enhanced CVD, ALD and MOCVD.
SIMS is a high sensitivity surface analysis technique applied to CVD grown thin films.
Mass Spectrometers for Surface Analysis
ALD Atomic Layer Deposition – Vacuum Processing of Thin Films
Sampling Inlets for Hiden Mass Spectrometers: Gas, Vapour and Liquid Sampling Systems
Mass Spectrometers for Gas Analysis Applications
High Performance Mass Spectrometers for Vacuum and Semiconductor Process Monitoring
Hiden HPR-20 R&D for Advanced Research
Hiden EQP Mass/Energy Analyser for Plasma Diagnostics and Characterisation (Introduction)
Hiden EQP Applications Mass/Energy Analyser for Plasma Diagnostics and Characterisation
Hiden ESPion Advanced Langmuir Probe for Plasma Diagnostics & Characterisation
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