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Vacuum Process Gas Analysers for CVD / MOCVD / ALD

For further information and pricing, please get in touch with us.

For direct information on gas reactions in process monitoring

Gas reaction kinetics studies and gas composition measurements are of vital importance in the process development and monitoring of chemical vapour deposition processes.

Overview

Application areas include growth of hard coatings, solar cells, diamond, DLC, nitrides, III-V’s and II-VI materials.

Hiden gas and plasma analysers include special sampling technology enabling high sensitivity analysis of the critical species in most CVD techniques including hot filament CVD, plasma enhanced CVD, ALD and MOCVD.

SIMS is a high sensitivity surface analysis technique applied to CVD grown thin films.

Further Reading

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Reductive Thermal Atomic Layer Deposition Process for Gold 10.14 MB 9 downloads

Reductive Thermal Atomic Layer Deposition Process for Gold ...
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Spatially-Modulated Silicon Interface Energetics Via Hydrogen Plasma-Assisted Atomic Layer Deposition of Ultrathin Alumina 2.33 MB 9 downloads

Spatially-Modulated Silicon Interface Energetics Via Hydrogen Plasma-Assisted Atomic...
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Carbon incorporation in MOCVD of MoS2 thin films grown from organosulfide precursor 4.17 MB 18 downloads

Carbon incorporation in MOCVD of MoS2 thin films grown from organosulfide precursor ...
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SWCNT growth on Al/Fe/Mo investigated by in situ mass spectroscopy. 1.61 MB 32 downloads

SWCNT growth on Al/Fe/Mo investigated by in situ mass spectroscopy. ...
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In situ characterisation of atomic layer deposition of titanium dioxide from titanium isopropoxide and water. 223.92 KB 37 downloads

In situ characterisation of atomic layer deposition of titanium dioxide from titanium...
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Growth mechanisms of carbon nanofilaments on Ni-loaded diamond catalyst. 1.47 MB 36 downloads

Growth mechanisms of carbon nanofilaments on Ni-loaded diamond catalyst. ...