Quadrupole Mass Spectrometers for Thin Films and Surface Engineering
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Plasma characterisation, plasma ion analyzers and langmuir probes
Thin film processing in research, development and functionalisation of surfaces has a broad application range in microelectronics, nanotechnology, solar, flat panel, mechanics, optics, photonics, textiles, coatings, chemistry, biology, and medicine.
Thin film processing utilises a wide range of techniques, including :
ALD – atomic layer deposition
CVD – chemical vapour deposition
MOCVD – metal organic chemical vapour deposition
PECVD – plasma enhanced chemical vapour deposition
MBE – molecular beam epitaxial growth
RIE – plasma reactive ion etch
IBE/RIBE – ion beam etch and reactive ion beam etc
Each technique is often tailored for a specific application, requiring special process parameters to produce the surface/film properties required. Hiden mass spectrometers provide critical insight into thin film processing and characterisation enabling optimisation of thin film production and surface quality.
Hiden mass spectrometers are used for process control including SIMS end point detection of ion beam etch of magnetic thin films, III-V layers including gallium arsenide, and superconducting thin films including YBaCuO yttrium barium copper oxide, and for flux monitoring where precise control of film growth in MBE is required.
Residual gas analysers are used for process monitoring and leak detection, offering a unique window into the vacuum processing environment. Analysis of the partial pressures of vacuum residuals including water vapour, hydrocarbons, VOC’s, and air leaks is routine.
The Hiden SIMS Workstation is used for post process analysis of thin films providing depth profiling and fine focus surface imaging of MBE grown thin films, glass coatings, magnetic thin films and metal oxides.
Mass Spectrometers for Surface Analysis
Mass Spectrometers for Thin Films, Plasma and Surface Engineering
Mass Spectrometers for Residual Gas Analysis – RGA
High Performance Mass Spectrometers for Vacuum and Semiconductor Process Monitoring
Systems for Quality Control and Characterisation of MBE Processes
HPR-30 Process Monitoring Mass Spectrometers – Differentially Pumped and High Pressure RGA Systems for Process Monitoring
HPR-30 Vacuum Process Gas Analyser | A differentially pumped RGA system for vacuum process monitoring
Hiden EQP Mass/Energy Analyser for Plasma Diagnostics and Characterisation
Hiden ESPion Advanced Langmuir Probe for Plasma Diagnostics & Characterisation
Hiden TPD Workstation | A complete experimental system for UHV temperature programmed desorption (TPD) studies
Hiden SIMS | Analytical Secondary Ion Mass Spectrometry Products
IMP EPD – End Point Detector An overview of the Hiden Analytical SIMS end point detector system for ion beam etch applications
High Five: UHV SIMS with Plasma Primary & Simultaneous Positive and Negative Secondary Ion Detection
What Products Can Be Used for Plasma Engineering
Surface Engineering of Thin Film Materials
Exploring Spectrometers for Thin Film Applications
Solar Cell Thin Film Analysers: The Basics
Solar Cell Thin Film Analysers from Hiden Analytical
Surface Analysis with Hiden Analytical Products