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Enhance Component Performance with Titanium Nitride Deposition using HiPIMS

High Power Impulse Magnetron Sputtering (HiPIMS) is an advanced sputtering technique that enhances the performance and properties of coatings, such as titanium nitride (TiN), by providing increased surface density, reduced friction, and lower substrate temperature. Discover the benefits and applications of HiPIMS for TiN deposition.


Understanding HiPIMS: An Advanced Sputtering Technique

HiPIMS, an evolution of conventional magnetron sputtering, offers a unique solution for increasing plasma density and sputtering rates. The technique overcomes the heat generation limitations of traditional methods by applying short, intense pulses to the cathode, with peak power ranging from kW to MW. These pulses generate an extremely dense plasma near the cathode while keeping heat and average operating power low.

Benefits of Titanium Nitride Coatings Using HiPIMS

Titanium nitride (TiN) coatings deposited with HiPIMS technology offer increased hardness and wear resistance over bulk materials. These ultra-hard coatings maintain surface conformity, making them suitable for dimensionally sensitive components such as fasteners, cutting devices, and gears.

Mass Resolved Ion Spectra: A Comprehensive Plasma Analysis

Utilizing the Hiden EQP mass and energy analyzer system, HiPIMS enables thorough analysis of plasma species in terms of mass and energy. This allows for direct monitoring of the deposition plasma and correlation of changes in parameters such as pressure, gas composition, plasma power, and duty cycle with the resulting film properties. In TiN deposition plasmas, the mass spectral data provides insights into nitrogen, titanium, and argon isotopes and compounds, as well as isotopic and molecular species.

time averaged mass spectrum from a titanium nitride HiPIMS

Time averaged mass spectrum from a titanium nitride HiPIMS plasma 

Unlocking the Potential of HiPIMS for Advanced Coating Solutions

HiPIMS technology offers a powerful approach for depositing high-quality, wear-resistant titanium nitride coatings. Its ability to control the deposition plasma allows for the fine-tuning of coating properties, ensuring optimal performance in a variety of applications. Explore the potential of HiPIMS for your next advanced coating solution. For more information on our low pressure plasma and mass spectrometry solutions, contact the Hiden Analytical team today.

Further Reading

Description of HiPIMS plasma regimes in terms of composition, spoke formation and deposition rate

The behaviour of Cu and Cr HiPIMS (high power impulse magnetron sputtering) discharges was investigated by a combination of optical emission spectroscopy, energy-resolved mass spectrometry and optical imaging, for the complete current–voltage characteristic range achievable within our experimental conditions. Inflection points typical of HiPIMS current–voltage characteristics separate plasma regimes perfectly differentiated in terms of flux composition of species towards the substrate, deposition rate, and the nature of plasma self-organization. The reorganization of the HiPIMS plasma into spokes (areas of high ionization over the target) is associated to one regime of high plasma conductivity, where also deposition rate is limited. This spoke-dominated regime can be substituted by a homogeneous regime at higher powers, where there is an increase of deposition rate, which is driven mostly by an increase in the flux of metal neutrals and metal double-charged ions. The relevance of secondary electron emission mechanisms for the support of the spoke-dominated regime in reactive and non-reactive sputtering conditions is discussed.

Teresa de los Arcos, Raphael Schroder, Yolanda Aranda Gonzalvo, Volker Schulz-von der Gathen and Jorg Winter

Online at: http://stacks.iop.org/0963-0252/23/054008