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Plasma Enhanced Atomic Layer Deposition (PEALD)

Plasma Enhanced Atomic Layer Deposition PEALD
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Plasma Enhanced Atomic Layer Deposition (PEALD) represents a cutting-edge technique for creating ultra-thin, highly uniform coatings of materials such as Titanium Nitride (TiN).

TiN coatings are widely recognized for their hardness, chemical stability, and electrical properties, making them ideal for applications in microelectronics, wear-resistant coatings, and decorative finishes. The precise control of film properties offered by PEALD is critical for advancing these technologies.


Understanding and controlling the plasma environment is crucial for optimizing PEALD processes. The plasma phase in PEALD directly impacts the growth rate, film density, and composition of the deposited layers. Detailed analysis of the ions, radicals, and neutrals present in the plasma allows for the fine-tuning of process parameters, leading to improved deposition outcomes and material properties.

Titanium Nitride Deposition Insights with the EQP Series

For Titanium Nitride (TiN) deposition, the EQP Series has proven invaluable. Key insights include:

  • Ion Energy Distribution Analysis: Tailoring the ion energy allows for the control over film density and mechanical properties.
  • Mass Spectra of Reactive Species: Identifying reactive radicals and their contribution to the film growth process enables the optimization of deposition conditions for enhanced film quality.

Applications and Benefits

The application of the Hiden EQP Series in TiN PEALD processes offers several benefits, including:

  • Enhanced Film Quality: Improved control over film thickness, uniformity, and composition.
  • Process Efficiency: Reduced trial-and-error in process development through real-time analysis.
  • Innovation Enablement: Supports the development of new applications for TiN coatings by understanding and controlling the PEALD process at a fundamental level.

Time averaged mass spectrum from titanium nitride HiPIMS plasma

Learn More and Contact Us

Discover how the Hiden EQP Series can transform your PEALD processes for Titanium Nitride deposition and beyond. For more information and to discuss your specific application needs, contact our team of experts today.