Plasma Radicals

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Film growth precursors in a remote SiH4 plasma used for high-rate deposition of hydrogenated amorphous silicon. 180.12 KB

Film growth precursors in a remote SiH4 plasma used for high-rate deposition of hydrogenated...
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Control of dissociation by varying oxygen pressure in noble gas admixtures for plasma processing. 117.65 KB

Control of dissociation by varying oxygen pressure in noble gas admixtures for plasma...