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- Create Date December 20, 2016
- Last Updated June 25, 2020
In this issue :
Customer Research
Highly selective etching of SiO2 over Si3N4 and Si in capacitively coupled plasma employing C5HF7 gas. Project Summary by: Y. Miyawaki, M. Sekine, K. Ishikawa, T. Hayashi, and M. Hori, et al. Nagoya University, Department of Engineering, Nagoya, Japan
High power impulse magnetron sputtering (HIPIMS) and traditional pulsed sputtering (DCMSP) Ag-surfaces leading to E. coli inactivation. Project Summary by: John Kiwi, Laboratory of Photonics and Interfaces, EPFL-SB-ISIC-LPI, Bât Chimie, Station 6, CH-1015 Lausanne, Switzerland
Magnesium nitride phase formation through new ion beam implantation technique. Project Summary by: Dr. Daniel Höche, Department of Corrosion and Magnesium Surface Technology, Institute of Materials Research, Helmholtz-Zentrum Geesthacht, Zentrum für Material- und Küstenforschung GmbH, Max-Planck-Straße 1, D-21502 Geesthacht, Germany
Ion density increase in high power twin-cathode magnetron system. Project Summary by: O.V. Vozniy, Département Science et Analyse des Matériaux (SAM), Centre de Recherche Public – Gabriel Lippmann, 41, rue du Brill, L-4422 Belvaux, Luxembourg
Products Referenced in this Issue
IG20 for UHV Surface Analysis Applications. The IG20 features a high brightness electron impact gas ion source which is designed specifi cally for oxygen capability but is also suitable for use with inert and other gases : Surface Analysis, Thin Films & Surface Engineering, Surface Science, Nanotechnology, Auger Electron Spectroscopy, Ion Beam Sputtering, Rastering Depth Profiling
EQP – Plasma Sampling Mass Spectrometer. The Hiden EQP is a combined mass / energy analyser for the analysis of positive AND negative ions, neutrals, and radicals from plasma processes : Analysis of positive ions, negative ions, neutral radicals and neutrals, Etching / Deposition Studies, Ion Implantation / Laser Ablation, Residual Gas Analysis / Leak Detection, Plasma electrode coupling – follow electrode conditions during operation, Analysis through a viewport, grounded electrode, driven electrode.
ESPion – for Measurement of Plasma Properties. The ESPion advanced Langmuir probe for rapid, reliable and accurate plasma diagnostics for industry and academia : Etching / Deposition / Cleaning Plasma Processes, Pulsed plasma operation, Ion density (Ni & Gi), Electron retardation (Te & EEDF), Electron density (Ne), Plasma Potential, Debye Length, floating potential, Ion flux.
MAXIM – for Static & Dynamic SIMS/SNMS. A state of the art secondary ion mass spectrometer for static and dynamic SIMS and SNMS applications : Depth profiling with depth resolution for multiple components analysed on the nanometre scale, Chemical 3D imaging with wide area scanning, and with spatial resolution in the low 10’s of micron, SNMS quantitative depth profiling included for analysis of nano to micron scale multilayer coatings with concentration measured in the 0.1% to 100% range, Surface composition analysis with detection to < 5 x 1015 atoms per cubic cm (atoms/cc), Analysis of all elements, oxides, semiconductor compounds/dopants and clusters to 1000amu.
In the Press
Dedicated probe for SIMS/SNMS. The Hiden EQS-series of quadrupole mass spectrometer probes were introduced for measurement of external ions in a vacuum environment, specifi cally for application to the SIMS surface analysis technique. The systems are now even further enhanced by the addition of a new high-effi ciency electron bombardment ion source mounted at the immediate entry region to the probe for direct measurement of secondary neutrals (SNMS), enabling quantifi cation of concentration over the full abundance range from trace level to 100%…
