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- Create Date December 13, 2016
- Last Updated June 25, 2020
Dec 13, 2016
In this issue :
Surface characteristics of parylene-C films in an inductively coupled O2/CF4 gas plasma. Project Summary by: Dr Yong-Hyun Ham and Professor Kwang-Ho Kwon, Korea University, Korea
O– density measurements in the pulsed-DC reactive magnetron sputtering of titanium. Project Summary by: Professor James Bradley, University of Liverpool, UK
Metal-carbon composites and multilayer thin films prepared by plasma assisted sequential deposition. Project Summary by: Ph.D Tomy Acsente, National Institute for Lasers, Plasma and Radiation Physics, Romania
Hiden ESPion plasma probe measurements on a hollow-cathode based large-volume plasma source. Project Summary by: Burkhard Zimmermann, Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik FEP, Germany
MAXIM SIMS/SNMS Workstation. A state of the art secondary ion mass spectrometer for static and dynamic SIMS and SNMS applications
ESPion Advanced Langmuir Probe. The ESPion advanced Langmuir probe for rapid, reliable and accurate plasma diagnostics for industry and academia
HPR-30 Vacuum Process Gas Analyser. The HPR-30 process gas analysis system is a compact gas analysis system for monitoring residual gases and vacuum processes
The Hiden TPD Workstation for UHV Thermal Desorption Studies. The TPD Workstation is a complete turnkey station for UHV temperature programmed desorption studies and is suited to both quality control and to research applications...
The HPR60-EQP Atmospheric Plasma Monitor. The system is configured specifically for measurement of atmospheric plasma using three stages of pressure reduction, with orifice sampling providing fast transfer of neutrals and of reactive species direct to the mass spectrometer stage…
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