Plasma diagnostic study of silicon nitride film growth in a remote Ar–H2–N2–SiH4 plasma: Role of N and SiHn radicals.

Aug 25, 2016

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Plasma diagnostic study of silicon nitride film growth in a remote Ar–H2–N2–SiH4 plasma: Role of N and SiHn radicals.

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Plasma diagnostic study of silicon nitride film growth in a remote Ar–H2–N2–SiH4 plasma: Role of N and SiHn radicals.

Plasma diagnostic study of silicon nitride film growth in a remote Ar–H2–N2–SiH4 plasma: Role of N and SiHn radicals.

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