Vacuum Process Gas Analyser

Oct 4, 2016

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File Size 2.48 MB
File Count 1
Create Date October 4, 2016
Last Updated October 4, 2016

Vacuum Process Gas Analyser

The compact Hiden HPR-30 differentially-pumped mass spectrometer enables real-time measurement and control of gas composition in vacuum processes in the pressure regime 1mbar to 10E-4mbar, addressing multiple process areas including vacuum coating, plasma etching, sputter deposition, CVD/MOCVD and RIE...

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Vacuum Process Gas Analyser

Vacuum Process Gas Analyser

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