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Hiden Analytical are proud sponsors of the AVS Online Short Course “Atomic Layer Etching


Tuesday: Friday, February 8, 2022
Time: 10:00 a.m.-5:00 p.m. EST

Course Objectives

  • Learn the fundamentals of ALE based on sequential self-limiting reactions.
  • Understand the differences between plasma ALE and thermal ALE.
  • Learn about the surface chemistry and reactors for ALE.
  • Understand why plasma ALE can obtain atomic layer precise anisotropic etching.
  • Learn how thermal ALE can achieve atomic layer precise isotropic etching.
  • Learn how ALE can be utilized for thin film nanoengineering and device fabrication.
  • Understand the many current and potential applications of ALE

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