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Hiden Analytical are proud sponsors of the AVS Online Short Course “Plasma Etching and RIE: Fundamentals & Applications


Tuesday: February 1, 2022 (Day 1: Fundamentals)
Wednesday: February 2, 2022 (Day 2: Applications)
Time: 10:00 a.m.-5:00 p.m. EST

Course Objectives

  • Know the basic concepts of plasma etching.
  • Understand the physics of RF glow discharges (both high and low density).
  • Understand the surface science aspects of reactive ion etching (RIE).
  • Learn about plasma-surface chemistry leading to etching.
  • Recognize the factors that influence etching anisotropy.

You can register your details to “Join the audience

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