Next Generation

TDSLab Series
for Advanced Materials Analysis

TDSLab Series

Features

UHV System – Customisable Multiport UHV Chamber

Temperature Limits – From -100-1000°C Sample Stage

Temperature Control – From 0.5 to 500°C/min

TDSLab Series

Performance

Sensitivity – <0.01 wt.ppm Hydrogen in Steel

Speed – High Speed PIC Detector

Accuracy – Optimised UHV System to Minimise Background Contributions

TDSLab Series

Software Package

User Friendly Interface

Simplified Experiment Management

Comprehensive Data Analysis Tools

Customisable 3D Data Analysis

Real-time Data Monitoring

TDSLab Series

Applications

Thin Film Research

Photovoltaic Studies

Hydrogen in Metals Analysis

Semiconductor Research

Nuclear Fusion Applications

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