Vacuum Process Gas Analysers for CVD / MOCVD / ALD
Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al2O3 Films on Metallic Ti Substrates 4.18 MB 4 downloads
Combination of Multiple Operando and In-Situ CharacterizationTechniques in a Single...
Reductive Thermal Atomic Layer Deposition Process for Gold 10.14 MB 13 downloads
Reductive Thermal Atomic Layer Deposition Process for Gold ...
Spatially-Modulated Silicon Interface Energetics Via Hydrogen Plasma-Assisted Atomic Layer Deposition of Ultrathin Alumina 2.33 MB 14 downloads
Spatially-Modulated Silicon Interface Energetics Via Hydrogen Plasma-Assisted Atomic...
A Secondary Reaction Pathway for the Alumina Atomic Layer Deposition Process with Trimethylaluminum and Water, Revealed by Full-Range, Time-Resolved In Situ Mass Spectrometry 4.22 MB 22 downloads
A Secondary Reaction Pathway for the Alumina Atomic Layer Deposition Process with...
Carbon incorporation in MOCVD of MoS2 thin films grown from organosulfide precursor 4.17 MB 23 downloads
Carbon incorporation in MOCVD of MoS2 thin films grown from organosulfide precursor ...
SWCNT growth on Al/Fe/Mo investigated by in situ mass spectroscopy. 1.61 MB 37 downloads
SWCNT growth on Al/Fe/Mo investigated by in situ mass spectroscopy. ...
In situ characterisation of atomic layer deposition of titanium dioxide from titanium isopropoxide and water. 223.92 KB 42 downloads
In situ characterisation of atomic layer deposition of titanium dioxide from titanium...
