ALD Atomic Layer Deposition –
Vacuum Processing of Thin Films
ToF-qSIMS
Nanoscale Surface Analysis for ALD Films.
EQP Series
Rapid acquisition mass and energy analysis for plasma-assisted ALD.
HPR-30 Series
Precise process gas analysis across a wide sampling pressure range.
HMT
Reliable vacuum process analysis and RGA in high-pressure environments.
Knowledge, Experience, Expertise
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