Plasma Etching Archives - Hiden Analytical

Formation of SCF+SCF2 and CS2 + ions during gas modulation cycles associated with interference between alternating C4F8 and SF6 in Ar plasma

by Hattie Payne | Jan 26, 2026

Formation of SCF+SCF2 and CS2 + ions during gas modulation cycles associated with interference between alternating C4F8 and SF6 in Ar plasma

by Jess Adamson | Aug 2, 2024

Etch characteristics of maskless Oxide/Nitride/Oxide/Nitride (ONON) stacked structure using C4H2F6-based gas

by Caroline Wardropper | Nov 15, 2023

by Caroline Wardropper | Nov 22, 2022

Database Development of SiO2 Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe

by hiden | Oct 2, 2016

Selective etching of (Ba,Sr)TiO3 thin films over silicon in an inductively coupled plasma.

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