The AVS Topical Conference on Atomic Layer Deposition (ALD 2015) is dedicated to the science and technology of atomic layer controlled deposition of thin films. Atomic layer deposition (ALD) is used to fabricate ultrathin and conformal thin film structures for many semiconductor and thin film device applications. A unique attribute of ALD is that it uses sequential self-limiting surface reactions to achieve control of film growth in the monolayer or sub-monolayer thickness regime. ALD is receiving attention for its potential applications from advanced electronics, microsystems, and displays to energy capture and storage, solid state lighting, biotechnology, security, and consumer products – particularly for any advanced technologies that require control of film structure in the nanometer or sub-nanometer scale.
Hiden exhibited at 15th International Conference on Atomic Layer Deposition, June 28th – July 1st, 2015 Portland, Oregon USA. Gerard Duffy from Hiden Inc attended and exhibited.
The Hiden Booth at ALD 2015
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