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A mass and energy analyser for plasma diagnostics
Hiden plasma probes measure some of the key plasma parameters and provide detailed information relating to plasma reaction chemistry.
A wide range of industrial processes use electrical plasmas, and new applications are developing rapidly. In the microelectronics industry the demands of higher yields and shrinking device geometries mean that process reproducibility and understanding is vital.
Detailed understanding of the reaction kinetics of plasma ions and neutral species plays a key role in the development of advanced surface engineering processes such as HIPIMS.
Mass Analysis of CF3I Decomposition in a Surface Barrier Discharge – GEC 2011
Mass Spectroscopy of Metastable Atomic Species in Gas Analysis and Processing Plasmas at High Spectrometer Source Pressures – AVS 2011
Mass Spectroscopy of Metastable Species during Plasma Processing – GEC 2011
AP0381 Ti and Al ion irradiation during Ti1-xAlxN alloy film growth
AP0193 – Overcoming the geometrical limitations of conventional sputtering by controlling the ion-to-neutral ratio during high power pulsed magnetron sputtering
AP0027 – Preparation and Characterisation of Nickel Based Catalysts for Partial Oxidation of Methane (138 KB)
The system is supplied with MASsoft Professional software.
This Windows 10 and Windows 11 compatible software allows control of the instrument via USB 2.0, RS232 or Ethernet. Provides comprehensive I/O for data output and for reading data from external devices for integration and display with mass spectrometer data.